| Number | Author | Title | |
| 1 | A. Storm | Contamination control knowledge development at TNO | TNO |
| 2 | F. Spreitler | EUV-Reflectometry@Zeiss: Metrology for serial production of EUV optics | Zeiss |
| 3 | A. Guggenmos | Broadband aperiodic CrSc multilayer mirrors for attosecond water window pulses | LMU |
| 4 | C. Bundesmann | Tailoring of thin film properties by (dual) ion beam sputter deposition | IOM |
| 5 | M. Störmer | Preparation and characterization of magnetron-sputtered single layers of Ta | HZG |
| 6 | I. Mantouvalou | Highly Brilliant Laser-Produced Plasma Source for spectroscopy and metrology in XUV and EUV | TU Berlin |
| 7 | V. Zabrodskii | Optimization of the Xe laser-plasma EUV source with an intensive UV preionization | Ioffe |
| 8 | S. Herbert | Investigations of EUV conversion efficiency of luminophores | RWTH |
| 9 | V. Zabrodskii | First test of MPPC silicon detector for operation in VUV | Ioffe |
| 10 | V. Zabrodskii | Precision silicon detectors activities in the Ioffe Institute: Retrospective and state-of-the-art | Ioffe |
| 11 | V. Zabrodskii | Radiation hardness assurance testing of n-p / p-n photodiodes at 13.5 nm | Ioffe |
| 12 | K. Johnston | Principles and Application of the Excalibur X-ray System | AWE |
| 13 | C. Bentley | Low Energy X-ray Characterisation Requirements and Facilities Supporting High Energy Density Laser Plasma Experiments at the ORION Laser Facility | AWE |
| 14 | K. Brent | Manson Mark V X-ray System: A tool for laser diagnostic and target analysis | AWE |
| 15 | S. Nannarone | Metrology opportunities at BEAR | IOM-CNR |
| 16 | A. Sokolov | The New XUV Optics Beamline at BESSY II | HZB |
| 17 | G. Kunkemöller | LIFT-OFF FABRICATION OF EUV-PROXIMITY PRINTED INFRARED NANOANTENNAS | RWTH |
| 18 | T. Siefke | Wire grid polarizers for UV applications | IAP |
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